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Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

scholarly article by Kaupo Kukli et al published November 2004 in Journal of Applied Physics

Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

scholarly article by Kaupo Kukli et al published May 2005 in Journal of Applied Physics

Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

scholarly article by Kaupo Kukli et al published May 2002 in Thin Solid Films

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