Lista de obras -

A New Light for Berkeley Lab—the Advanced Light Source Upgrade

artículo científico publicado en 2019

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

artículo científico publicado en 2014

A method of image-based aberration metrology for EUVL tools

artículo científico publicado en 2015

Aberration estimation using EUV mask roughness

artículo científico publicado en 2015

Accelerating EUV learning with synchrotron light: mask roughness challenges ahead

artículo científico publicado en 2011

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

artículo científico publicado en 2014

Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating

scientific article published on 01 June 2020

Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

artículo científico publicado en 2016

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging.

artículo científico publicado en 2017

Analytic descriptions of parabolic X-ray mirrors

artículo científico publicado en 2022

Application of phase shift focus monitor in EUVL process control

artículo científico publicado en 2013

Beamline Optics and Modeling School (BLOMS) 2023

artículo científico publicado en 2023

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

artículo científico publicado en 2021

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

artículo científico publicado en 2015

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

artículo científico publicado en 2019

Commissioning an EUV mask microscope for lithography generations reaching 8 nm

artículo científico publicado en 2013

Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study

artículo científico publicado en 2020

Data-driven modeling and control of an X-ray bimorph adaptive mirror

artículo científico publicado en 2023

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

artículo científico publicado en 2015

Derivation of closed-form ellipsoidal X-ray mirror shapes from Fermat's principle

artículo científico publicado en 2022

Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

artículo científico publicado en 2018

Diaboloidal mirrors: algebraic solution and surface shape approximations

artículo científico publicado en 2021

EUV Research at Berkeley Lab: Enabling Technologies and Applications

artículo científico publicado en 2015

EUV actinic brightfield mask microscopy for predicting printed defect images

artículo científico publicado en 2015

EUV mask multilayer defects and their printability under different multilayer deposition conditions

artículo científico publicado en 2012

EUV photolithography mask inspection using Fourier ptychography

artículo científico publicado en 2018

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

artículo científico publicado en 2014

Emulation of anamorphic imaging on the SHARP EUV mask microscope

artículo científico publicado en 2016

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

artículo científico publicado en 2016

Enabling EUV Resist Research at the 1x and Smaller Regime

artículo científico publicado en 2015

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

artículo científico publicado en 2015

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

artículo científico publicado en 2015

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

artículo científico publicado en 2015

Ex situ tuning of bendable x-ray mirrors for optimal beamline performance

artículo científico publicado en 2012

Examination of phase retrieval algorithms for patterned EUV mask metrology

artículo científico publicado en 2015

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

artículo científico publicado en 2014

Experimental verification of high-NA imaging simulations using SHARP

artículo científico publicado en 2020

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

artículo científico publicado en 2014

Extreme ultraviolet microscope characterization using photomask surface roughness

artículo científico publicado en 2020

Field-varying aberration recovery in EUV microscopy using mask roughness

artículo científico publicado en 2018

Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

artículo científico publicado en 2014

Image-based pupil plane characterization via a space-domain basis

artículo científico publicado en 2017

Image-based pupil plane characterization via principal component analysis for EUVL tools

artículo científico publicado en 2016

In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer

artículo científico publicado en 2013

Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope

artículo científico publicado en 2013

Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

artículo científico publicado en 2015

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

artículo científico publicado en 2015

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

artículo científico publicado en 2016

Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope

artículo científico publicado en 2017

Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays

artículo científico publicado en 2012

Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays

artículo científico publicado en 2013

Modal wavefront reconstruction from its gradient

artículo científico publicado en 2015

New techniques for the measurement of x-ray beam or x-ray optics quality

New ways of looking at masks with the SHARP EUV microscope

artículo científico publicado en 2015

Off-axis aberration estimation in an EUV microscope using natural speckle

artículo científico publicado en 2016

Off-axis representation of hyperbolic mirror shapes for X-ray beamlines

artículo científico publicado en 2023

Optical modeling of Fresnel zoneplate microscopes ⬇️

artículo científico publicado el 10 de julio de 2011

Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power.

artículo científico publicado en 2016

Partially Coherent Quantitative Phase Retrieval for EUV Lithography

artículo científico publicado en 2015

Phase measurements of EUV mask defects

artículo científico publicado en 2015

Phase-enhanced defect sensitivity for EUV mask inspection

artículo científico publicado en 2014

Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology

artículo científico publicado en 2016

Printability of native blank defects and programmed defects and their stack structures

artículo científico publicado en 2011

Printability study of pattern defects in the EUV mask as a function of hp nodes

artículo científico publicado en 2012

Pseudo-gray-scale halftone gratings for shearing and Hartmann wavefront sensors

artículo científico publicado en 2021

Pupil shaping and coherence control in an EUV mask-imaging microscope

artículo científico publicado en 2013

Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts

artículo científico publicado en 2023

Recovering effective amplitude and phase roughness of EUV masks

artículo científico publicado en 2013

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

scientific article published on 01 September 2020

Simulations of applications using diaboloid mirrors

artículo científico publicado en 2021

Taking a SHARP look at mask 3D effects

artículo científico publicado en 2017

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

artículo científico publicado en 2013

Thickness dependence of piezo-bimorph adaptive mirror bending

artículo científico publicado en 2023

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

artículo científico publicado en 2016

Upgrade to the SHARP EUV mask microscope

artículo científico publicado en 2019

Lista de obras de

A New Light for Berkeley Lab—the Advanced Light Source Upgrade

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

A method of image-based aberration metrology for EUVL tools

Aberration estimation using EUV mask roughness

Accelerating EUV learning with synchrotron light: mask roughness challenges ahead

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope

Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating

Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging.

Analytic descriptions of parabolic X-ray mirrors

Application of phase shift focus monitor in EUVL process control

Beamline Optics and Modeling School (BLOMS) 2023

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

Commissioning an EUV mask microscope for lithography generations reaching 8 nm

Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study

Data-driven modeling and control of an X-ray bimorph adaptive mirror

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Derivation of closed-form ellipsoidal X-ray mirror shapes from Fermat's principle

Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

Diaboloidal mirrors: algebraic solution and surface shape approximations

EUV Research at Berkeley Lab: Enabling Technologies and Applications

EUV actinic brightfield mask microscopy for predicting printed defect images

EUV mask multilayer defects and their printability under different multilayer deposition conditions

EUV photolithography mask inspection using Fourier ptychography

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Enabling EUV Resist Research at the 1x and Smaller Regime

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Ex situ tuning of bendable x-ray mirrors for optimal beamline performance

Examination of phase retrieval algorithms for patterned EUV mask metrology

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Experimental verification of high-NA imaging simulations using SHARP

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

Extreme ultraviolet microscope characterization using photomask surface roughness

Field-varying aberration recovery in EUV microscopy using mask roughness

Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

Image-based pupil plane characterization via a space-domain basis

Image-based pupil plane characterization via principal component analysis for EUVL tools

In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer

Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope

Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope

Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays

Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays

Modal wavefront reconstruction from its gradient

New techniques for the measurement of x-ray beam or x-ray optics quality

New ways of looking at masks with the SHARP EUV microscope

Off-axis aberration estimation in an EUV microscope using natural speckle

Off-axis representation of hyperbolic mirror shapes for X-ray beamlines

Optical modeling of Fresnel zoneplate microscopes ⬇️

Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power.

Partially Coherent Quantitative Phase Retrieval for EUV Lithography

Phase measurements of EUV mask defects

Phase-enhanced defect sensitivity for EUV mask inspection

Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology

Printability of native blank defects and programmed defects and their stack structures

Printability study of pattern defects in the EUV mask as a function of hp nodes

Pseudo-gray-scale halftone gratings for shearing and Hartmann wavefront sensors

Pupil shaping and coherence control in an EUV mask-imaging microscope

Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts

Recovering effective amplitude and phase roughness of EUV masks

Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing

Simulations of applications using diaboloid mirrors

Taking a SHARP look at mask 3D effects

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Thickness dependence of piezo-bimorph adaptive mirror bending

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Upgrade to the SHARP EUV mask microscope