Lista de obras - Detlef Rogalla - Dominio Público Uruguay

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

artículo científico publicado en 2020

A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

scientific article published on 23 September 2020

An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure

artículo científico publicado en 2018

Analysis of surface, subsurface, and bulk hydrogen in ZnO using nuclear reaction analysis

article

Anisotropy of Hydrogen Diffusivity in ZnO

Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties

article published in 2012

Atomic Layer Deposition of HfO2 Thin Films Employing a Heteroleptic Hafnium Precursor

scholarly article by Ke Xu et al published March 2012 in Chemical Vapor Deposition

Atomic Vapor Deposition Approach to In 2 O 3 Thin Films

article

Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor

CVD-grown copper tungstate thin films for solar water splitting

Change of the 7Be electron capture half-life in metallic environments

Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties

article published in 2017

Creation of colour centres in diamond by collimated ion-implantation through nano-channels in mica

scholarly article by S. Pezzagna et al published 31 August 2011 in Physica Status Solidi

Determination of141Pr(α,n)144Pm cross sections at energies of relevance for the astrophysicalpprocess using theγγcoincidence method

scholarly article

Development of graded Ni-YSZ composite coating on Alloy 690 by Pulsed Laser Deposition technique to reduce hazardous metallic nuclear waste inventory.

artículo científico publicado en 2011

Diffusion across the glass transition in silicate melts: Systematic correlations, new experimental data for Sr and Ba in calcium-aluminosilicate glasses and general mechanisms of ionic transport

Diffusivity of Hydrogen in ZnO Single Crystal

Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD

article

Engineering single photon emitters by ion implantation in diamond.

artículo científico publicado en 2009

Evaluation of Homoleptic Guanidinate and Amidinate Complexes of Gadolinium and Dysprosium for MOCVD of Rare-Earth Nitride Thin Films

article

Experimental resolution of deuterium and hydrogen depth profiling with the nuclear reactions D(3He,p)α and p(15N,α,γ)12C

Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors

article

Free electron properties and hydrogen in InN grown by MOVPE

From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

artículo científico publicado en 2020

High-throughput compositional and structural evaluation of a Li(a)(Ni(x)Mn(y)Co(z))O(r) thin film battery materials library

artículo científico publicado en 2013

Homoleptic Gadolinium Amidinates as Precursors for MOCVD of Oriented Gadolinium Nitride (GdN) Thin Films

article

Hydrogen Charging Effects in Pd/Ti/TiO2/Ti Thin Films Deposited on Si(111) Studied by Ion Beam Analysis Methods

Hydrogen Interaction with Defects in ZnO

Hydrogen absorption and diffusivity in ZnO single crystals

article

Hydrogen content analysis in hydrogen-charged PZT ferroelectric ceramics

Hydrogen-Induced Plastic Deformation in ZnO

Implantation of defined activities of phosphorus 32 with reduced target damage

scientific article published on 01 November 2018

Influence of post-hydrogenation upon electrical, optical and structural properties of hydrogen-less sputter-deposited amorphous silicon

article by S. Gerke et al published January 2016 in Thin Solid Films

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition

article

Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN.

artículo científico publicado en 2017

Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films

scientific article published on 01 February 2019

Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition.

artículo científico publicado en 2017

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

artículo científico publicado en 2019

Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides

artículo científico publicado en 2019

MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties

scholarly article by Manish Banerjee et al published 25 July 2014 in Chemical Vapor Deposition

MOCVD of TiO2thin films from a modified titanium alkoxide precursor

article

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics

Magnetic properties of Gd-doped GaN

Measurement of theRe187(α,n)Ir190reaction cross section at sub-Coulomb energies using the Cologne Clover Counting Setup ⬇️

scholarly article

Morphology and Hydrogen in Passivating Amorphous Silicon Layers

Nanostructured Fe2 O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor

New amidinate complexes of indium(iii): promising CVD precursors for transparent and conductive In2O3 thin films.

artículo científico publicado en 2017

New experimental approach to study aqueous alteration of amorphous silicates at low reaction rates ⬇️

scholarly article

Novel β-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for solution based processing of ZrO2 thin films.

artículo científico publicado en 2013

Photoactive Zinc Ferrites Fabricated via Conventional CVD Approach

article

Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition

Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors.

artículo científico publicado en 2012

Single-photon emission from Ni-related color centers in CVD diamond

scholarly article published 30 April 2010

Spatial Atmospheric Pressure Atomic Layer Deposition of Tin Oxide as an Impermeable Electron Extraction Layer for Perovskite Solar Cells with Enhanced Thermal Stability

artículo científico publicado en 2018

Stellar and Primordial Nucleosynthesis ofBe7: Measurement ofHe3(α,γ)Be7

scientific article published in Physical Review Letters

Structural and electrical properties of Nb-doped TiO 2 films sputtered with plasma emission control

Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films

artículo científico publicado en 2017

Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer depositions of zinc oxide.

artículo científico publicado en 2016

Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization

article published in 2013

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Volatile, Monomeric, and Fluorine-Free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide

article

Lista de obras de Detlef Rogalla

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure

Analysis of surface, subsurface, and bulk hydrogen in ZnO using nuclear reaction analysis

Anisotropy of Hydrogen Diffusivity in ZnO

Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties

Atomic Layer Deposition of HfO2 Thin Films Employing a Heteroleptic Hafnium Precursor

Atomic Vapor Deposition Approach to In 2 O 3 Thin Films

Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor

CVD-grown copper tungstate thin films for solar water splitting

Change of the 7Be electron capture half-life in metallic environments

Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties

Creation of colour centres in diamond by collimated ion-implantation through nano-channels in mica

Determination of141Pr(α,n)144Pm cross sections at energies of relevance for the astrophysicalpprocess using theγγcoincidence method

Development of graded Ni-YSZ composite coating on Alloy 690 by Pulsed Laser Deposition technique to reduce hazardous metallic nuclear waste inventory.

Diffusion across the glass transition in silicate melts: Systematic correlations, new experimental data for Sr and Ba in calcium-aluminosilicate glasses and general mechanisms of ionic transport

Diffusivity of Hydrogen in ZnO Single Crystal

Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD

Engineering single photon emitters by ion implantation in diamond.

Evaluation of Homoleptic Guanidinate and Amidinate Complexes of Gadolinium and Dysprosium for MOCVD of Rare-Earth Nitride Thin Films

Experimental resolution of deuterium and hydrogen depth profiling with the nuclear reactions D(3He,p)α and p(15N,α,γ)12C

Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors

Free electron properties and hydrogen in InN grown by MOVPE

From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

High-throughput compositional and structural evaluation of a Li(a)(Ni(x)Mn(y)Co(z))O(r) thin film battery materials library

Homoleptic Gadolinium Amidinates as Precursors for MOCVD of Oriented Gadolinium Nitride (GdN) Thin Films

Hydrogen Charging Effects in Pd/Ti/TiO2/Ti Thin Films Deposited on Si(111) Studied by Ion Beam Analysis Methods

Hydrogen Interaction with Defects in ZnO

Hydrogen absorption and diffusivity in ZnO single crystals

Hydrogen content analysis in hydrogen-charged PZT ferroelectric ceramics

Hydrogen-Induced Plastic Deformation in ZnO

Implantation of defined activities of phosphorus 32 with reduced target damage

Influence of post-hydrogenation upon electrical, optical and structural properties of hydrogen-less sputter-deposited amorphous silicon

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition

Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN.

Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films

Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition.

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides

MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties

MOCVD of TiO2thin films from a modified titanium alkoxide precursor

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics

Magnetic properties of Gd-doped GaN

Measurement of theRe187(α,n)Ir190reaction cross section at sub-Coulomb energies using the Cologne Clover Counting Setup ⬇️

Morphology and Hydrogen in Passivating Amorphous Silicon Layers

Nanostructured Fe2 O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor

New amidinate complexes of indium(iii): promising CVD precursors for transparent and conductive In2O3 thin films.

New experimental approach to study aqueous alteration of amorphous silicates at low reaction rates ⬇️

Novel β-ketoiminato complexes of zirconium: synthesis, characterization and evaluation for solution based processing of ZrO2 thin films.

Photoactive Zinc Ferrites Fabricated via Conventional CVD Approach

Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition

Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors.

Single-photon emission from Ni-related color centers in CVD diamond

Spatial Atmospheric Pressure Atomic Layer Deposition of Tin Oxide as an Impermeable Electron Extraction Layer for Perovskite Solar Cells with Enhanced Thermal Stability

Stellar and Primordial Nucleosynthesis ofBe7: Measurement ofHe3(α,γ)Be7

Structural and electrical properties of Nb-doped TiO 2 films sputtered with plasma emission control

Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films

Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer depositions of zinc oxide.

Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Volatile, Monomeric, and Fluorine-Free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide