Dysprosium scandate thin films as an alternate amorphous gate oxide prepared by metal-organic chemical vapor deposition

LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors

Liquid Injection MOCVD of Dysprosium Scandate Films

Mononuclear precursor for MOCVD of HfO2 thin films

scientific article published on 17 June 2004