$1/f$ Noise in Drain and Gate Current of MOSFETs With High-$k$ Gate Stacks

(Invited) Defect Engineering for Monolithic Integration of III-V Semiconductors on Silicon Substrates

artículo científico publicado en 2021

(Invited) Defect Engineering for Monolithic Integration of III-V Semiconductors on Silicon Substrates

artículo científico publicado en 2021

A 1006 element hybrid silicon pixel detector with strobed binary output

A 1006 element hybrid silicon pixel detector with strobed binary output

Analog design with Line-TFET device experimental data: from device to circuit level

artículo científico publicado en 2020

Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?

artículo científico publicado en 2018

Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors

Deep levels in heat-treated and²⁵²Cf-irradiated p-type silicon substrates with different oxygen content

artículo científico publicado en 1994

Degradation of high-resistivity float zone and magnetic Czochralski n-type silicon detectors subjected to 2-MeV electron irradiation

Development of silicon micropattern pixel detectors

Device Performance as a Metrology Tool to Detect Metals in Silicon

artículo científico publicado en 2019

Different stress techniques and their efficiency on triple-gate SOI n-MOSFETs

Effect of Grown-In Defects on the Structure of Oxygen Precipitates in Cz-Si Crystals with Different Diameter

Electrical stress on irradiated thin gate oxide partially depleted SOI nMOSFETs

Gate induced floating body effects in TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs

Hot-carrier-induced degradation of drain current hysteresis and transients in thin gate oxide floating body partially depleted SOI nMOSFETs

Impact of Direct Plasma Hydrogenation on Thermal Donor Formation in n-Type CZ Silicon

Impact of hot-carrier stress on gate-induced floating body effects and drain current transients of thin gate oxide partially depleted SOI nMOSFETs

Influence of the pre-treatment anneal on Co–germanide Schottky contacts

Integration of CMOS-electronics and particle detector diodes in high-resistivity silicon-on-insulator wafers

Interfacial Properties of nMOSFETs With Different Al 2 O 3 Capping Layer Thickness and TiN Gate Stacks

artículo científico publicado en 2021

Low Frequency Noise Analysis of Impact of Metal Gate Processing on the Gate Oxide Stack Quality

artículo científico publicado en 2018

Low-Frequency Noise Assessment of Vertically Stacked Si n-Channel Nanosheet FETs With Different Metal Gates

artículo científico publicado en 2020

Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks

artículo científico publicado en 2019

Low-Frequency Noise Characterization of Germanium n-Channel FinFETs

artículo científico publicado en 2020

Low–Frequency Noise in Vertically Stacked Si n–Channel Nanosheet FETs

artículo científico publicado en 2020

Progressive degradation of TiN∕SiON and TiN∕HfO[sub 2] gate stack triple gate SOI nFinFETs subjected to electrical stress

Temperature-Dependent Electrical Properties of nMOSFETs With Different Thickness Al₂O₃ Capping Layer and TiN Gate

artículo científico publicado en 2021

Tin Doping of Silicon for Controlling Oxygen Precipitation and Radiation Hardness

Using the Octagonal Layout Style for MOSFETs to Boost the Device Matching in Ionizing Radiation Environments

artículo científico publicado en 2020